Nanoimprint Lithography (NIL) was (proposed by Prof. Stephen Y. Chou of Princeton University in 1995 as a simple, low-cost, and high-throughput method for producing nanoscale patterns. It is a form of ...

nano-imprint lithography (including micro-contact printing, mold-assisted lithography and hot embossing lithography), pattern formation based on phase separation of polymers, self-assembly of ...

Capillary force lithography exploits the capillary action of a liquid confined between an elastomeric stamp and a substrate to create patterns. When the stamp is brought into contact with the ...

Scientists have used photovoltaic charge lithography to imprint surface charges on passive dielectric substrates by shining a halogen lamp onto iron-doped lithium niobate. The technique may support ...

As a leading semiconductor equipment manufacturer, its cutting-edge lithography systems are essential for producing the chips that power everything from smartphones and AI systems to advanced ...

One of the most complex parts of this process is lithography: the step in which shapes are drawn onto a silicon wafer. There are several ways to do this, all of them rather complicated ...

There is a new type of EUV lithography using only four reflective mirrors overturns conventional technology and will contribute to advanced semiconductors at 7nm and below. Professor Tsumoru Shintake ...