When the lithography machine is running, the heat generated is quickly transferred to the silicon carbide water-cooled ...

Industrial ceramics, with their high hardness, wear resistance, high temperature resistance, and strong chemical stability, ...

The phenomenal rate of increase in the integration density of silicon chips has been sustained in large part by advances in optical lithography — the process that patterns and guides the ...

Lithography uses a kind of template, called a photomask—or just mask—for creating patterns on semiconductor wafers. The industry is always looking for methods that improve resolution and ...

The primary advantage of EUV lithography is its ability to create extremely fine patterns on silicon wafers, which is necessary for modern semiconductor devices demanding higher performance and lower ...

To realize photomasks for beyond 2nm generation EUV lithography, requires patterns 20% smaller than those for the 3nm generation. This refers not only to the size and shape of the patterns, ...

Using a direct-write laser system, I created micro-scale patterns in photoresist—no masks, no cleanroom. This is how maskless lithography works for prototyping and research.

Commences sample supply of high-NA EUV photomasks for next-generation semiconductors Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required ...

TOKYO, December 12, 2024--DNP has achieved the fine pattern resolution required for photomasks for logic semiconductors of beyond 2nm generation that support EUV lithography.