Haozhe "Harry" Wang, assistant professor of electrical and computer engineering (ECE) at Duke University and an expert in developing new methods for manufacturing materials, continues to push the ...

Back in 2006, University of California, Los Angeles (UCLA) engineer Patrick Pribyl had an idea for a better way to control the plasma used in chip manufacturing during the etching process.

Technical Terms Plasma Etching: A process that employs ionised gases to remove material from a substrate, typically in a directional manner, through physical and chemical interactions.

Plasma etching process has gained huge attention as the most probable technology that could break the limits of conventional etching process.

In the semiconductor manufacturing process, etching equipment can be regarded as the core equipment, and ceramic cavities are ...

In the process of doing so, they discovered that with the right process applied to the right thickness and orientation of wood grain, the plasma treatment resulted in a surprisingly dark end result.

Plasma etching is a cornerstone technique in semiconductor fabrication, enabling the precise removal of material layers through the use of ionised gases. This process is essential for fabricating ...

Whether Samsung still uses this particular apparatus is unknown, but vacuum chambers are necessary during the dry etching process due to the plasma. Types of etching ...

With regard to our etching platforms, we provide a specialized atomic layer etching process solution designed specifically for gallium nitride-based devices. This unique process enables etching at the ...

Plasma etching is perhaps the most essential process in semiconductor manufacturing, and possibly the most complex of all fab operations next to photolithography. Nearly half of all fab steps rely on ...

DirectDrive generates plasma with 100x faster responsiveness than previous sources, resulting in fewer patterning defects during chip making.