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Haozhe "Harry" Wang, assistant professor of electrical and computer engineering (ECE) at Duke University and an expert in developing new methods for manufacturing materials, continues to push the ...
Back in 2006, University of California, Los Angeles (UCLA) engineer Patrick Pribyl had an idea for a better way to control the plasma used in chip manufacturing during the etching process.
Plasma Etching: A process that employs ionised gases to remove material from a substrate, typically in a directional manner, through physical and chemical interactions.
In the semiconductor manufacturing process, etching equipment can be regarded as the core equipment, and ceramic cavities are ...
In this research, a process that enables the etching of large-scale (4-inch) MoS₂ to the desired atomic layer thickness using the two plasma processes of plasma-enhanced chemical vapor ...
Plasma etching is a cornerstone technique in semiconductor fabrication, enabling the precise removal of material layers through the use of ionised gases. This process is essential for fabricating ...
Plasma etching is perhaps the most essential process in semiconductor manufacturing, and possibly the most complex of all fab operations next to photolithography. Nearly half of all fab steps rely on ...
Jun 22, 2023: Large-scale (4-inch) plasma etching technology for mass production of next-generation two-dimensional semiconductors (Nanowerk News) A groundbreaking plasma etching technology has been ...
In the process of doing so, ... Sometimes, these nanoscale devices are produced with plasma etching, which sounds about as cool as it actually is.
Previously, switching between different power levels in the plasma process took far too long, causing imprecise results. Pribyl’s method, which is now called DirectDrive, could make those ...