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The laminating [FeAlN (50 nm)/NiFe or Cu (10 nm)] 20 films were fabricated by magnetron sputtering method and the magnetoimpedance (MI) ratio of these films was measured. Results show that the MI ...
The laminating [FeAlN (50 nm)/NiFe or Cu (10 nm)] 20 films were fabricated by magnetron sputtering method and the magnetoimpedance (MI) ratio of these films was measured. Results show that the MI ...
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