When the lithography machine is running, the heat generated is quickly transferred to the silicon carbide water-cooled ...

Lithography uses a kind of template, called a photomask—or just mask—for creating patterns on semiconductor wafers. The industry is always looking for methods that improve resolution and ...

Industrial ceramics, with their high hardness, wear resistance, high temperature resistance, and strong chemical stability, ...

Imec has unveiled a new climate-friendly way to produce patterns on chips using lithography and etch for advanced chip factories.. Leuven, Belgium-based Imec said the tech can reduce the carbon ...

Using a direct-write laser system, I created micro-scale patterns in photoresist—no masks, no cleanroom. This is how maskless lithography works for prototyping and research.

To realize photomasks for beyond 2nm generation EUV lithography, requires patterns 20% smaller than those for the 3nm generation. This refers not only to the size and shape of the patterns, ...

Commences sample supply of high-NA EUV photomasks for next-generation semiconductors Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required ...

TOKYO, December 12, 2024--DNP has achieved the fine pattern resolution required for photomasks for logic semiconductors of beyond 2nm generation that support EUV lithography.