In double patterning lithography (DPL), overlay errors between two patterning steps of the same layer translate into CD variability. Since CD uniformity budget is very tight, meeting requirement of ...

In this paper, a new Radiation-Hardened-By-Design (RHBD) SRAM is proposed to mitigate the Single Event Upset (SEU) and Single Event Double Node Upset (SEDU). The Monte-Carlo analysis with 5000 ...