The authors propose a new method to obtain 20 nm patterns during the lithographic process step with a self-generated hard mask This process mixes two resists: hydrogensilsquioxane (HSQ) and chemically ...

With the continuous advancement of semiconductor manufacturing technology, integrated circuits now incorporate billions of mask pattern data. In the event of non-compliance with mask design rules ...

Industrial ceramics, with their high hardness, wear resistance, high temperature resistance, and strong chemical stability, ...

Developing a method to pattern organic molecules, particularly on the sub-100-nm scale, is of wide interest in current nanoscience for a broad range of technological applications. Because of the ...

When the lithography machine is running, the heat generated is quickly transferred to the silicon carbide water-cooled ...