When the lithography machine is running, the heat generated is quickly transferred to the silicon carbide water-cooled ...

Lithography uses a kind of template, called a photomask—or just mask—for creating patterns on semiconductor wafers. The industry is always looking for methods that improve resolution and ...

These include near-field optical lithography, direct patterning on a nanometer scale with scanning-probe microscopes, nano-imprint lithography (including micro-contact printing, mold-assisted ...

Industrial ceramics, with their high hardness, wear resistance, high temperature resistance, and strong chemical stability, ...

Imec has unveiled a new climate-friendly way to produce patterns on chips using lithography and etch for advanced chip factories.. Leuven, Belgium-based Imec said the tech can reduce the carbon ...

To realize photomasks for beyond 2nm generation EUV lithography, requires patterns 20% smaller than those for the 3nm generation. This refers not only to the size and shape of the patterns, ...

Commences sample supply of high-NA EUV photomasks for next-generation semiconductors Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required ...

TOKYO, December 12, 2024--DNP has achieved the fine pattern resolution required for photomasks for logic semiconductors of beyond 2nm generation that support EUV lithography.