Optical lithography is a critical technique to fabricate nano-scale semiconductor devices by replicating the layouts of integrated circuits from the lithography mask onto the silicon wafer. As the ...

Zeiss’ precise mirror technology that is installed in the optical system of ASML’s High-NA EUV lithography scanners. Source: Zeiss Collaborations While ASML is currently the sole provider of High-NA ...

While ASML pushes the boundaries of optical lithography, China—cut off from the most advanced chipmaking tools—is trying to extract more from the older ASML machines (capable of 28nm and above ...

Conventional optical lithography is hindered by the diffraction limit, and electron beam lithography is not applicable to metal nanofilms.

Optical lithography is a photographic procedure in which a light-sensitive polymer, known as a photoresist, is exposed and developed to generate 3D relief images on a substrate.

Chemically amplified resists (CARs) have dominated the field of optical lithography for decades and will continue to do so for selected use cases. But High NA EUV may mark a breakthrough for ...

In this paper, we present the development of a lithography simulation tool set for source mask optimization. In our lithography simulation tool set, users can set optical conditions such as the ...

Here, Professor Wei Xiong, from the Wuhan National Laboratory for Optoelectronics at Huazhong University of Science and Technology, propose a novel multi-photon polymerization lithography ...

The project's approach hinges on the way that spatial patterning of optical gain can be created on an unpatterned area of III-V semiconductor material with no predefined features using the "imaginary" ...

Researchers have created a photonic device that provides programmable on-chip information processing without lithography, offering the speed of photonics augmented by superior accuracy and ...